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1、The information contained herein is, as far as we are aware, true and accurate. However, no representations or warranties, either express or implied, whether of merchantable quality, fitness for any particular purpose or of any other nature are hereby made in respect of the information contained in
2、this presentation or the product or products which are the subject of it. In providing this material, no license or other rights, whether express or implied, are given with respect to any existing or pending patent, patent application, trademarks, or other intellectual property right.AZ9260 Photores
3、ist Data Package at 12um FT & 24um FTAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 2MEMS / Ink JetFT: 30 mLift-offDeep Implant /Metal
4、 EtchCopper PlatingGold PlatingSolder / Metal PlatingFT: 2-7 mFT: 3-10 mFT: 5-30 mFT: 10-30 mFT: 30 mDUVTFRH/ImplantFT: 3 - 8 mAZs Thick Film Photoresist Roadmap as of 11/2007 Materials under developmentAZLExp 500AZ 12XT-20PMaterials in sampling(all EXP products)AZ 40XT-11AZ 40XT-A1Commercialized ma
5、terialsAZ nLOFSeriesAZ MIR 900 AZ 33XTAZ N4000AZ N6000AZ TX 1311VS-01HJAZ PLP30/40AZ 10XTAZ 5XTAZ 5nXTAZ 3nXT-HRAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Elect
6、ronic Materials.page 3AZ Electronic Materials Thick Photoresist Product Summary? Platform: DNQ = Novolak, CA = Chemically Amplified, PP = Photopolymer? Wavelength: Red font indicates better performance.? Developer Compatibility: Bold font indicates most compatible developer, resulting in shorter dev
7、elop times and lower exposure energies.Thick Film ProductPlatformFT Range (um)Maximum Single coatAspect RatioApplicationDeveloper CompatibilityP4000DNQg-h2 - 55252:1Solder, Cu, Au400K / TMAH4500DNQg-h2 - 55252:1Solder, Cu, Au400K / TMAH9200DNQg-h-i3 - 50253:1Solder, Cu400K / TMAH10XTDNQg-h-i4 - 5025
8、3:1Solder, Cu, Au400K / TMAH33XTDNQg-h-i5 - 25255:1Solder, CuTMAH / 400K50XTDNQg-h15 - 65653:1Solder, Cu400KPLP-30DNQg-h6 - 25252:1Au, Cu303NPLP-40DNQg-h20 - 30302:1Au, Cu303NEXP 12XT-20PCAg-h-i5 - 20203:1CuTMAHEXP 5XTCAg-h-i3 - 552:1Si, Implant, EtchTMAHEXP 40XTCAg-h-i20 - 100604:1Etch, Solder, CuT
9、MAH / 400KEXP 125nXTPPg-h-i20 - 1201205:1Cu, Au, SolderTMAH / 303NEXP 3nXT-HRCAg-h-i3 - 555:1Cu, NiFe, SiTMAHEXP 5nXTCAg-h-i5 - 15153:1Cu, NiFe, SiTMAHTX 1311CADUV3 - 5515:1Cu, NiFe, SiTMAHAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX,
10、HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 4MTI Flexifab coat and bakeStatic dispense on 6” silicon 30 sec spin indicated rpmSB: 110C in proximity10 sec 0.050”, 180 sec 0.002”Spin Speed (rpm)Film Thickness (m)AZ9260 Photoresist on SiliconFilm Th
11、ickness vs. Spin Speed5678910111213141510001500200025003000350040004500AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 5AZ 9260 Table of Co
12、ntents 12m FT Process & Performance Results Pages 6 22 Ultratech 1500 with AZ 300 MIF developer 12m FT Process & Performance Results Pages 23 35 Suss MA200 with AZ 400K 1:4 Developer 24m FT Process & Performance Results Pages 36 52 Ultratech 1500 with AZ 400K 1:4 Developer 24m FT Process
13、 & Performance Results Pages 53 65 Suss MA200 with AZ 300 MIF developer AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 6AZ 9260 Photor
14、esist Lithographic Evaluationby Ultratech 1500 Stepper with AZ 300 MIF Developer12m FT ProcessAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.pa
15、ge 7AZ9260 PhotoresistProcess Conditions:Substrate: Bare SiliconCoat: Optitrac Static dispenseTarget FT: 12 mSoftbake: 110C hotplate/ 180 sec. full contactExposure: Ultratech 1500 gh line Stepper FEM: 1200 mJ/cm2 with increments of 75 mJ/cm2Nominal Focus of -2m in increments of 2m in both directions
16、Develop: AZ 300MIF (2.38% TMAH) continuous spray for 400 sec. 23CAnalysis: Amray SEMAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 8AZ9260
17、 Photoresist Features (1:1) Film Thickness( m) DTP 10 m (mJ/cm) Exposure Latitude 10 m (%) DOF 10 m ( m) Linearity ( m) Dense Lines 12 1798 106 16.0 4.0 Contact Holes 12 1539 90 8 8 10 Summary of Results:AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademar
18、ks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 39Optitrac coat and BakeSB: 1st layer 110C/ 80 sec2nd layer 115C/180 sec Ultratech 1500 gh line Stepper AZ 400K 1:4, 600 sec continuous spray 27 CExposure Dose (mj/cm)Measured Linewidth (
19、m)AZ 9260 Photoresist, FT=24 m Exposure Latitude on Silicon, 10.0 m L/S88.599.51010.51111.512157516501725180018751950202521002175225023251900 mj/cm22% Exposure LatitudeAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD,
20、PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 401725 mJ/cm1800 mJ/cmOptitrac coat and BakeSB: 1st layer 110C/ 80 sec2nd layer 115C/180 sec Ultratech 1500 gh line Stepper AZ 400K 1:4, 600 sec continuous spray 27 C2100 mJ/cm2025 mJ/cm1875 mJ/cm1950 mJ/cm2175 mJ/cm1650 mJ
21、/cmAZ 9260 Photoresist, FT=24 m Exposure Latitude on Silicon, 10.0 m L/SAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 418.759.259.7510.25
22、10.7511.25-16.0-14.0-12.0-10.0-8.0-6.0-4.0-2.00.02.04.0Focus (m)Measured Linewidth (m)AZ9260 Photoresist, FT=24 m Depth of Focus 1875 mJ/cm, 10.0 m L/SOptitrac coat and BakeSB: 1st layer 110C/ 80 sec2nd layer 115C/180 sec Ultratech 1500 gh line Stepper AZ 400K 1:4, 600 sec continuous spray 27 CAZ, t
23、he AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 42-12.0 m-10.0 m-8.0 mOptitrac coat and BakeSB: 1st layer 110C/ 80 sec2nd layer 115C/180 sec Ult
24、ratech 1500 gh line Stepper AZ 400K 1:4, 600 sec continuous spray 27 C0.0 m-2.0 m-4.0 m-6.0 m-14.0 m2.0 mAZ9260 Photoresist, FT=24 m Depth of Focus 1875 mJ/cm, 10.0 m L/SAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD
25、, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 432.04.06.08.010.012.014.016.018.020.022.02.04.06.08.010.012.014.016.018.020.022.0Nominal Linewidth (m)Measured Linewidth (m)AZ9260 Photoresist, FT=24 m Linearity on Silicon 1875 mJ/cmOptitrac coat and BakeSB: 1st layer 1
26、10C/ 80 sec2nd layer 115C/180 sec Ultratech 1500 gh line Stepper AZ 400K 1:4, 600 sec continuous spray 27 CAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic
27、 Materials.page 4415 m12 m10.0 m9.0 mOptitrac coat and BakeSB: 1st layer 110C/ 80 sec2nd layer 115C/180 sec Ultratech 1500 gh line Stepper AZ 400K 1:4, 600 sec continuous spray 27 C5.0 m6.0 m7.0 m8.0 m20 m4.0 mAZ9260 Photoresist, FT=24 m Linearity on Silicon 1875 mJ/cmAZ, the AZ logo, BARLi, Aquatar
28、, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 45Optitrac coat and BakeSB: 1st layer 110C/ 80 sec2nd layer 115C/180 sec Ultratech 1500 gh line Stepper AZ 400K 1:4, 600 s
29、ec continuous spray 27 CExposure Dose (mj/cm)Measured Linewidth (m)AZ9260 Photoresist, FT=24 m Exposure Latitude on Silicon, 10.0 m CH, 1:1 Pitch88.599.51010.51111.512150015751650172518001875195020252100217522501805 mj/cm30% Exposure LatitudeAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Kleboso
30、l, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 461650 mJ/cm1725 mJ/cmOptitrac coat and BakeSB: 1st layer 110C/ 80 sec2nd layer 115C/180 sec Ultratech 1500 gh line Stepper AZ 400K 1:4, 600 sec cont
31、inuous spray 27 C2025 mJ/cm1950 mJ/cm1800 mJ/cm1875 mJ/cm2100 mJ/cm1575 mJ/cm2175 mJ/cmAZ9260 Photoresist, FT=24 m Exposure Latitude on Silicon, 10.0 m CH, 1:1 PitchAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP
32、, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 471650 mJ/cm1725 mJ/cmOptitrac coat and BakeSB: 1st layer 110C/ 80 sec2nd layer 115C/180 sec Ultratech 1500 gh line Stepper AZ 400K 1:4, 600 sec continuous spray 27 C2025 mJ/cm1950 mJ/cm1800 mJ/cm1875 mJ/cm2100 mJ/cm1575 mJ/cm
33、2175 mJ/cmAZ9260 Photoresist, FT=24 m Exposure Latitude on Silicon, 10.0 m CH, 1:0.7 PitchAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 4
34、81650 mJ/cm1725 mJ/cmOptitrac coat and BakeSB: 1st layer 110C/ 80 sec2nd layer 115C/180 sec Ultratech 1500 gh line Stepper AZ 400K 1:4, 600 sec continuous spray 27 C2025 mJ/cm1950 mJ/cm1800 mJ/cm1875 mJ/cm2100 mJ/cm1575 mJ/cm2175 mJ/cmAZ9260 Photoresist, FT=24 m Exposure Latitude on Silicon, 10.0 m
35、CH, 1:0.3 PitchAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 498.759.259.7510.2510.7511.25-12.0-10.0-8.0-6.0-4.0-2.00.0Focus (m)Measured
36、Linewidth (m)AZ9260 Photoresist, FT=24 m Depth of Focus 1800 mJ/cm, 10.0 m CH, 1:1 PitchOptitrac coat and BakeSB: 1st layer 110C/ 80 sec2nd layer 115C/180 sec Ultratech 1500 gh line Stepper AZ 400K 1:4, 600 sec continuous spray 27 CAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spi
37、nfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 50-8.0 m-2.0 m-4.0 m-6.0 m-10.0 m1:11:0.71:0.3AZ9260 Photoresist, FT=24 m Depth of Focus 1800 mJ/cm, 10.0 m CH, Various PitchAZ, the AZ logo, BARLi, Aquatar, n
38、LOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 515.010.015.020.025.030.035.040.045.050.05.010.015.020.025.030.035.040.045.050.0Nominal Linewidth (m)Measured Linewidth (m)AZ
39、9260 Photoresist, FT=24 m Linearity on Silicon 1800 mJ/cm40.0 m to 10.0 m Contact Holes, 1:1 PitchOptitrac coat and BakeSB: 1st layer 110C/ 80 sec2nd layer 115C/180 sec Ultratech 1500 gh line Stepper AZ 400K 1:4, 600 sec continuous spray 27 CAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Kleboso
40、l, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 5230 m10 m20 m40 m1:11:0.71:0.3AZ9260 Photoresist, FT=24 m Linearity on Silicon 1800 mJ/cm40.0 m to 10.0 m Contact Holes, Various PitchAZ, the AZ log
41、o, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 53AZ 9260 PhotoresistLithographic Evaluationby Suss MA200 Mask Aligner with AZ 300 MIF Developer24m FT Pr
42、ocessAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 54AZ9260 PhotoresistProcess Conditions:Substrate: Bare SiliconCoat: Optitrac Static di
43、spenseTarget FT: 24 mSoftbake: 1st layer 110C hotplate/ 80 sec. full contact 2nd layer 115C hotplate/ 180 sec. full contact Exposure: Suss MA200 CC Mask Aligner with 20 m proximity gap FEM: 2200 mJ/cm2 with increments of 200 mJ/cm2Develop: AZ 300 MIF (2.38% TMAH) continuous spray for 720 sec. 23CAna
44、lysis: Amray SEMAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 55AZ 9260 Photoresist Features (1:1) Film Thickness( m) DTP 40 m (mJ/cm) Ex
45、posure Latitude 40 m (%) Linearity ( m) Dense Lines 24 2228 166 10 Contact Holes 24 1674 217 10 Summary of Results:AZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ El
46、ectronic Materials.page 563234363840424446489001200150018002100240027003000330036003900420045004800Film Thickness: 24 mOptitrac coat and BakeSB: 1st layer 110C/ 80 sec2nd layer 115C/180 sec Suss MA200 CC Mask Aligner20 m proximity gapAZ 300 MIF, 720 sec continuous spray 23 CExposure Dose (mj/cm)Meas
47、ured Linewidth (m)AZ9260 Photoresist, FT=24 m Exposure Latitude on Silicon , 40m L/S2228 mj/cm166% Exposure LatitudeAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ E
48、lectronic Materials.page 571575 mJ/cm1785mJ/cm1995 mJ/cmFilm Thickness: 24 mOptitrac coat and BakeSB: 1st layer 110C/ 80 sec2nd layer 115C/180 sec Suss MA200 CC Mask Aligner20 m proximity gapAZ 300 MIF, 720 sec continuous spray 23 C3400 mJ/cm3000 mJ/cm2600 mJ/cm2200 mJ/cm4000 mJ/cmAZ 9260 Photoresis
49、t, FT=24 m Exposure Latitude on Silicon, 40m L/S2400 mJ/cm1365 mJ/cm1155 mJ/cmAZ, the AZ logo, BARLi, Aquatar, nLOF, Kwik Strip, Klebosol, and Spinfil are registered trademarks and AX, DX, HERB, HiR, MiR, NCD, PLP, Signiflow, SWG, and TARP are trademarks of AZ Electronic Materials.page 585.015.025.0
50、35.045.055.065.075.085.05.015.025.035.045.055.065.075.085.0Nominal Linewidth (m)Measured Linewidth (m)AZ9260 Photoresist, FT=24 m Linearity on Silicon 2200 mJ/cmFilm Thickness: 24 mOptitrac coat and BakeSB: 1st layer 110C/ 80 sec2nd layer 115C/180 sec Suss MA200 CC Mask Aligner20 m proximity gapAZ 300 MIF, 720 sec cont