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1、EPE电吕工业克用设备刻蚀技术与设备AZ4620光刻胶的喷雾式涂胶工艺邢卓，錶蹈波(沈阳芯源徹电子设备有限公司，辽宁沈阳110168)摘 要：对于一些MEMS应用，需要在形貌起伏很大的晶圆表面均匀地涂布光刻胶。喷雾式涂 胶工艺满足了这些要求。研究了几种稀释的AZ4620光刻胶溶液的雾化喷涂性能，在沈阳芯源微 电子设备有限公司KS-M200-1SP喷雾式涂胶机上进行了雾化喷涂试验，分别对裸片及深孔不同 尺才的晶圆进行喷雾式涂胶实验；特别研究了决定喷涂薄膜膜厚和均匀性的光刻胶流量和浓度； 实验得到的膜厚和均匀性可以满足图形复杂、有深孔的晶圆。结尾列出了喷雾式涂胶在实际中的 一些应用。这些绪果证明喷
2、雾式涂胶存在的潜力以及美好前景。关键词：喷雾弍涂胶机；AZ4620光刻胶；膜厚；均匀性 中图分类号：TN3O5文献标识码：B文章编号：1004-4507(2011)12-0043-04Spray Coating of AZ4562 PhotoresistXING Li, WANG Mingbo(KING SEMI Co., Ltd, Shenyang 110168, China)Abstract: For several MEMS applications pattern transfer on wafers with extensive topography requires a unifo
3、rm resist layer over a nonplanar surface Spray coating of photoresist appears to be a promising technique In this paper, Spray coating and several solution of diluted AZ4620 photoresist are used to form a thick layer on flat wafers and to produce sufficient coverage on wafers with deep cavities rang
4、ing from 75 to 425 pum in depth A number of parameters that strongly influence the spray process are identified and their influence on resist thickness and uniformity is evaluated. The thickness and uniformity achieved is sufficient to pattern contact windows in very deep cavities and rather fine li
5、nes across less deep cavities.Several applications for MEMS using the spray coating of photoresist are demonstrated here These initial results are quite encouraging and well-defined multi-level micromachined structures appear to be feasibleKeywords: Spray coating; AZ4562 Photoresist; Thickness ; Uniformity不断发展的微电子机械系统(MEMS)和先进 化和更高的集成度的需求。对于一些MEMS应 封装技术要求新的技术和流程以满足进一步小型 用，需要在形貌起伏很大的晶圆表面(如90角、 收余日期：20111114l)cr. 2011（总第203期）